Optaglio

Autumn events 2010

Optaglio will be attending the following events taking place in the nearest future. We are looking forward to meeting you in Chicago, Madrid or Buenos Aires. Labelexpo Americas 2010 taking place on 14th-16th September 2010 in Chicago INTERGRAF International Security Printer’s Conference and Exhibition taking place on 13th-15th October 2010 in Barcelona Argentina Gráfica 2010 taking place on 18th–23rd October 2010 in Buenos Aires ...

IHMA Award for the Best Applied Decorative Product

We are pleased when our work is appreciated and gains recognition not only for technological achievements but also for the idea behind the image.IHMA Award is annually awarded for significant holographic projects and Optaglio has won this year’s award in the category of Best Applied Decorative Product for a common project with Platform Culture Central Europe at the Ministry of Foreign Affairs of the Czech Republic.The hologram presents a symbolic intellectual property protection and is an integral part of a publication by young central-european writers. It also contains the whole publication in nanotexts. ...

Security Printing 2010

As a proud sponsor of the event we are looking forward to seeing you at Security Printing 2010 conference taking place on 26th – 28th January 2010 in Hotel Corinthia in Prague. Please leave us a message at obchod@optaglio.cz if you are interested in attending the conference. ...

Important notice

We would like to inform you about an incident which has recently taken place in one of our production facilities located in Andover. Thank you for your patience and accept our apologies for any inconvenience that has been caused. Following the incident Optaglio Limited are moving to the Basepoint Business Center in Andover where our operations can be resumed very quickly. ...

Cartes 2009

Visit us at Cartes on 17th -19th November 2009 in Paris. We are looking forward to your visit at stand K4 077. Find out more about OVMesh™ - the unique product in polycarbonate document protection. ...

Technology of electron beam lithography

Silicon is the base material for the production of microprocessors. It indicates the start of the silicon age of holography. Holograms created by this technology are recorded to silicon substrate by perfectly focused controlled electron beam, which present very sensitive instrument for recording the hologram structure. It is much finer that the laser beam.

Electron beam records the hologram structure stepwise, engraved line after line and the whole process of recording is controlled and operated by computer. Thus generated hologram covers all potentials of hologram originated by laser technology; moreover it can contain far more complicated holographic design, in which we can precisely define visual and hidden features of each point of hologram. This unique characteristic of holograms generated by electron beam enables encoding of enormous number of security features into holographic structure.

Presently, we operate two technologies of electron beam lithography: MULTIMATRIX^® and eˉDIRECT™ - the technology with the highest degree of protection